Current research in the Kelber group focusses on the properties of surfaces in complex research environments, including plasmas, atomic layer deposition, and chemical vapor deposition. Currently, research is focussed in four major areas:
1. Plasma etching of existing and novel dielectrics
2. Plasma deposition of novel boron carbide-derived materials for electronic and neutron detection applications
3. Direct graphene and BN growth on magnetic oxides and other dielectric substrates for disruptive spintronics applications.
4. Plasma cleaning of microelectronic surfaces for packaging applications