This system features an unmonchromatized MgKα/AlKα dual anode x-ray source,  100 mm mean radius hemispherical analyzer with multichanneltron detector, 500 eV-1000 eV ion gun, and reverse-view LEED system.  The system is turbomolecularly pumped (base pressure = 5 x 10^-10 Torr) for rapid recovery of UHV conditions.  The system is integrated with a separately pumped chamber for atomic layer deposition or magnetron sputter deposition at temperatures up to 700 K .  Sample transport between chambers occurs under UHV conditions.   Representative results for PVD of Pt nanoclusters on clean vs. modified SrTiO₃(001) surfaces are shown in Figure 2.

Figure 1. Schematic of XPS/LEED system with integrated capabilities for ALD or magnetron sputter (physical) vapor deposition (PVD).

Figure 2.  (Left) Schematic for formation of metal-x (x=O, C) nanoclusters via magnetron sputter deposition.  (Right) Sputter deposited Pt nanoparticles on clean vs. hydroxylated SrTiO₃(001).  Annealed surface:  Binding energy decreases with increased cluster size due increased core hole screening. Hydroxylated surface: constant BE reflects Pt --> OH charge transfer. (XPS data, S. Manandhar, C. Vamala, B. Copp and J. A. Kelber, Surface Science (2009).